Role of Plasma Parameters on the Growth and Field Emission Properties of 2D Graphene Sheet

Authors

  • Neha Gupta Department of Applied Physics, Delhi Technological University, Delhi
  • Aarti Tewari Department of Applied Physics, Delhi Technological University, Delhi
  • Suresh C. Sharma Department of Applied Physics, Delhi Technological University, Delhi

DOI:

https://doi.org/10.26713/jamcnp.v2i3.348

Keywords:

Graphene, Plasma parameters, Thickness, Field emission

Abstract

The role of plasma parameters (electron density and temperature, ion density and temperature) on the growth and field emission properties of two dimensional graphene sheet has been theoretically investigated. A theoretical model of charge neutrality, including the kinetics of electrons, negatively and positively charged ions, neutral atoms and the energy balance of various species has been developed. Numerical calculations of the graphene for different plasma parameters (electron density and temperature, ion density and temperature) have been carried out for the typical glow discharge plasma parameters. It is found that the thickness of graphene sheet decreases with plasma parameters and hence the field emission of electrons from the graphene sheet increases. Some of our theoretical results are in compliance with the existing experimental observations.

Downloads

Download data is not yet available.

References

K.S. Novoselov, A.K. Geim, S.V. Morozov, D. Jiang, M.I. Katsnelson, I.V. Grigorieva, S.V. Dubonos and A.A. Firsov, Nature 438, 197 (2005).

G.D. Yuan, W.J. Zhang, Y. Yang, Y.B. Tang, Y.Q. Li, J.X. Wang, X.M. Meng, Z.B. He, C.M.L. Wu, I. Bello, C.S. Lee and S.T. Lee, Chem. Phys. Lett. 467, 361 (2009).

A. Malesevic, R Vitchev, K. Schouteden, A. Volodin, L. Zhang, G. Van Tendeloo, A. Vanhulsel and C.V. Haesendonck, Nanotechnology 19, 305604 (2008).

K. Yu, P. Wang, G. Lu, K.H. Chen and Z. Bo, J. Chen. Phys. Chem. Lett. 2, 537 (2011).

N. Soin, S.S. Roy, C. O'Kane, J.A.D. McLaughlin, T.H. Lim and C.J.D. Hetherington, Cryst. Eng. Comm. 13, 312 (2011).

B.L. French, J.J. Wang, M.Y. Zhu and B.C. Holloway, J. Appl. Phys. 97, 114317 (2005).

M. Hiramatsu, K. Shiji, H. Amano and M. Hori, Appl. Phys. Lett. 84, 4708 (2004).

J.J. Wang, M.Y. Zhu, R.A. Outlaw, X. Zhao, D.M. Manos, B.B. Holloway and V.P. Mammana, Appl. Phys. Lett. 85, 1265 (2004).

S. Kondo, M. Hori, K. Yamakawa, Shoji den, H. Kano and M. Hiramatsu, J. Vac. Sci. Technol. B 26, 4 (2008).

Y.S. Kim, J.H. Lee, Y.D. Kim, S.-K. Jerng, K. Joo, E. Kim, J. Jung, E. Yoon, Y.D. Park, S. Seo and S.-H. Chun, Nanoscale 5, 1221 (2013).

S. Vizireanu, S.D. Stoica, C. Luculescu, L.C. Nistor, B. Mitu and G. Dinescu, Plasma Sources Sci. Technol. 19, 034016 (2010).

G. Nandamuri, S. Roumimov and R. Solanki, Appl. Phys. Lett. 96, 154101 (2010).

K.Y. Seung, L.J. Hong, K.Y. Duck, J. Sahng-Kyoon, K. Joo, E. Kim, J. Jung, E. Yoon, P.Y. Daniel, S. Sunae and C. Seung-Hyun, Nanoscale 5, 1221 (2013).

C.S. Lee, L. Barton, Z.B. He, J.L. Maurice, D. Pribat and D. Cojocaru, Phys. Rev. 82, 153412 (2010).

A.K. Geim and K.S. Novoselov, Nat. Mater. 6, 18 (2007).

Z. Shuai, S. Pei, W. Ren, D. Tang, L. Gao, B. Liu, F. Li, C. Liu and H.M. Cheng, Adv. Mater. 21, 1756 (2009).

A. Malesevic, R. Kemps, A. Vanhulsel, M.P. Chowdhury, A. Volodin and C.V. Haesendonck, J. Appl. Phys. 104, 084301 (2008).

N. Soin, S.S. Roy, S. Roy, K.S. Hazra, D.S. Misra, T.H. Lim, C.J. Hetherington and J.A. McLaughlin, J. Phys. Chem. C 115, 5366 (2011).

U.A. Palnitkar, R.V. Kashid, M.A. More, D.S. Joag, L.S. Panchakarla and C.N.R. Rao, Appl. Phys. Lett. 97, 063102 (2010).

G. Eda, H.E. Unalan, N. Rupesinghe, G.A.J. Amaratunga and M. Chhowalla, Appl. Phys. Lett. 93, 233502 (2008).

Y. Zhang, J. Du, S. Tang, P. Liu, S. Deng, J. Chen and N. Xu, Nanotechnology 23, 015202 (2012).

T.T. Baby and S. Ramprahbu, J. Appl. Phys. 111, 04311 (2012).

S. Watcharotone, R.S. Ruoffa and F.H. Read, Physics Procedia 1, 71 (2008).

M.S. Sodha, S. Misra, S.K. Mishra and S. Srivastava, J. Appl. Phys. 107, 103307 (2010).

S.F. Lee, Y.-P. Chang and L.-Y. Lee, J. Mater. Sci. Mater. Electron 20, 851 (2009).

S.K. Srivastava, A.K. Shukla, V.D. Vankar and V. Kumar, Thin Solid Films 515, 1851 (2006).

N. Peltekias, S. Kumar, N. McEvoy, K. Lee, A. Weidlich and G. S. Duesberg, Carbon 50, 395 (2012).

L.V. Nang and E.T. Kim, Journal of The Electrochemical Society 159, K-93 (2012).

Downloads

Published

2015-12-28
CITATION

How to Cite

Gupta, N., Tewari, A., & Sharma, S. C. (2015). Role of Plasma Parameters on the Growth and Field Emission Properties of 2D Graphene Sheet. Journal of Atomic, Molecular, Condensed Matter and Nano Physics, 2(3), 215–227. https://doi.org/10.26713/jamcnp.v2i3.348

Issue

Section

Research Article